Grant extends dopant research - Embedded.com

Grant extends dopant research

LONDON — Innos is to work with the University of Southampton to research novel methods of dopant diffusion suppression in semiconductors.

The joint research follows the award of a five-year research fellowship by the Royal Academy of Engineering (RAEng) jointly with the Engineering and Physical Sciences Research Council (EPSRC) to Dr Huda Abdel Wahab Abdel Rahim El Mubarek of the School of Electronics and Computer Science, at the University of Southampton.

Dr El Mubarek will work with the team at Innos to further progress the University of Southampton and Innos patented research she completed in 2004 with Director at Innos, Professor Peter Ashburn. The research pioneered a technique that uses an optimised fluorine implant to completely suppress boron transient enhanced diffusion in silicon and silicon-germanium and significantly reduce boron thermal diffusion.

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